Challenges and Progress in Low Defectivity for advanced ArF Lithography Processes using Surface Localized Material Technology

Layout Design and Lithography Technology for Advanced Devices

OVERVIEW: The minimum feature size required for the most advanced semiconductor devices is now below half the exposure wavelength, and the optical lithography technology is facing its practical resolution limit. In this article, we review the current status of DFM and issues for further miniaturization. The role and requirements of metrology technology are also discussed. The layout design has ...

Extended Value Added Intellectual Coefficient in Advanced and Low Technology Manufacturing Companies in Malaysia

The main purpose of this study is to empirically compare of intellectual capital (IC) and its efficiency between advanced and low technology manufacturing companies using a sample of 135 Malaysian listed manufacturing companies during the 2006-2012 period. The manufacturing companies are classified into different sectors based on their products and services (Standard Industrial Classification (...

preparation and characterization of new co-fe and fe-mn nano catalysts using resol phenolic resin and response surface methodology study for fischer-tropsch synthesis

کاتالیزورهای co-fe-resol/sio2و fe-mn-resol/sio2 با استفاده از روش ساده و ارزان قیمت همرسوبی تهیه شدند. از رزین پلیمری resol در فرآیند تهیه کاتالیزور استفاده شد.

Scaling in Surface Hydrology: Progress and Challenges

Surface hydrology has experienced tremendous progress in the last few decades thanks to observational campaigns and platforms, the development of new theories and models, and the increase in computational power. Still, the spatial scales resolved in weather (~10 km) and climate (~100 km) models remain too coarse for accurate water resource management, prediction of floods, ecosystem services, a...

Electromembrane Processes, a Toolbox for Advanced Separations